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The concept of plasma and its properties can be traced back to the late 19th century. The development of plasma chamber chemistry is rooted in both theoretical and experimental advancements over the following decades.
Sir William Crookes (1879):
Discovery of "Radiant Matter": British physicist Sir William Crookes conducted experiments with cathode rays, leading to the identification of what he termed "radiant matter." This was one of the earliest observations of plasma, though not fully understood as such at the time.
Crookes Tube: His work with vacuum tubes and cathode rays laid foundational principles for future plasma research.
J.J. Thomson (1897): Electron Discovery: English physicist J.J. Thomson discovered the electron through experiments with cathode rays, further advancing the understanding of ionized gases.
Plasma State: Thomson's work helped to establish the concept of a fourth state of matter, beyond solid, liquid, and gas.
2. Irving Langmuir (1920s): Term "Plasma": American chemist and physicist Irving Langmuir coined the term "plasma" in 1928. He noticed that the ionized gas behaved like a plasma (a biological term), with ions and electrons interacting similarly to blood plasma.
Plasma Sheath and Oscillations: Langmuir's experiments and theoretical work on plasma oscillations and the double layer (plasma sheath) were critical in understanding plasma behavior.
Post-WWII Advances:
Vacuum Technology: The development of high-vacuum technology during and after World War II enabled more precise experiments with plasma.
Microwave and Radio Frequency Technology: Innovations in power supplies, particularly with microwave and radio frequency generators, allowed researchers to sustain plasmas more effectively.
Semiconductor Industry (1960s-1970s):
Plasma Etching and Deposition: The semiconductor industry played a significant role in advancing plasma chamber technology. Researchers developed plasma etching and deposition techniques to manufacture integrated circuits.
Bell Labs and IBM: Institutions like Bell Labs and IBM were at the forefront, developing plasma processes for microfabrication. The precision and control offered by plasma technology were crucial for the miniaturization of electronic components.
Cold Plasma and Environmental Applications (1980s-1990s):
Environmental Engineering: Researchers began exploring plasma for environmental applications, such as waste treatment and pollution control. Cold plasma technology, which operates at lower temperatures, became a focus for these applications due to its efficiency and effectiveness.
University Research: Academic institutions worldwide, including MIT and Stanford, contributed significantly to the theoretical and practical advancements in plasma chemistry during this period.
A plasma chamber is an enclosed space where a gas is ionized to create plasma using electric or magnetic fields. The process involves the following steps:
Plasma chemistry has a wide range of applications, including:
Plasma is often referred to as the fourth state of matter, distinct from solid, liquid, and gas. This classification is based on its unique properties:
Plasma Chemistry:
Traditional Chemistry:
Overall Cost Analysis:
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